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Fluorine Plasma Ion Implantation (Treatment) Technology: A New Dimension in GaN Device Processing

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What
  • Visitor Seminars
When Aug 01, 2008
from 02:00 PM to 03:00 PM
Where Engr IV Room 57-124
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K. J. Chen
Hong Kong University of Science and Technology

Friday, August 1, 2008, 2:00-3:00PM
Engr IV Room 57-124

Abstract: Not available.

Biography: Not available.

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