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High Efficiency 1060nm VCSELs for Low Power Consumption" and "Optical Absorption Coefficient of Carbon-doped GaAs Epitaxial Layer by Means of Propagation-Loss Measurement of Waveguide for Long Wavelength VCSEL
| What |
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| When |
May 15, 2009 from 03:00 PM to 03:00 PM |
| Where | Engr IV Room 57-124 |
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Takeo Kageyama
Photonic Device Laboratory, Furukawa Electric, Japan
Friday, May 15, 2009 at 3:00pm
Engr IV Room 57-124
Abstract
High efficiency Vertical-Cavity Surface-Emitting Lasers (VCSELs) will be
reviewed in terms of power conversion efficiency. Other lasing
parameters will be also discussed. The optical absorption coefficient
(?) for carbon-doped GaAs epitaxial layer by CBr4 with doping range from
1018 to 1020 cm-3 was measured for the first time. Obtained αGaAs:C was
2-times larger than αGaAs:Zn at 1300nm.
Biography
Takeo Kageyama received M.E. and Ph.D. in 1999 and 2001, respectively,
from Tokyo Institute of Technology. During his Ph.D. work, he studied
chemical beam epitaxy of 1300nm-range GaInNAs VCSELs. From August 2001
to February 2003, he joined Bandwidth9 Inc. at Fremont, CA, as a senior
engineer, working on MEMS-based 1550nm tunable-VCSELs using
tunnel-junction grown by MBE. From April 2003 to July 2003, he joined
P&I lab, Tokyo institute of Technology as a post-doctoral scientist,
1200nm-range highly strained GaInAsSb quantum well lasers. From August
2003, he joined Furukawa Electric Co. Ltd., Yokohama Research and
Development Laboratories. He is currently working on the development of
the design, growth, processing and characterization on 1300nm-range
GaInNAsSb-VCSELs and 1060nm-range InGaAs-VCSELs.
