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Home News News Archive 2012 The Nanoelectronics Research Facility Updates its Facility with an Atomic Layer Deposition System

The Nanoelectronics Research Facility Updates its Facility with an Atomic Layer Deposition System

Robert CandlerThe Nanoelectronics Research Facility (NRF) has received an award from the UCLA Shared Resources Consortium (SRC) to support purchase of an atomic layer deposition system.  This system will be used for deposition of multiple materials with atomic-level thickness control and will be open to all NRF users. The system will enhance the current capability with the addition of plasma, which allows deposition at lower temperatures.  It also has a load-locked environment for improved environmental control, enabling deposition of higher quality films.

The SRC was established by the Vice-Chancellor for research to "support instrumentation or personnel costs for existing and proposed Shared Resources (SRs) located on the UCLA campus."  The NRF is a shared campus facility for fabrication of micro- and nanoscale devices that has a broad user base consisting of users from UCLA, outside universities, and industry.  The technical director of the NRF is Steve Franz, and the Faculty Director is Professor Rob Candler.

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