Center for High Frequency Electronics (CHFE)
CHFE has been established with support from several governmental agencies and contributions from local industries. It started with a $10M grant from HP. A goal of the center is to combine, in a synergistic manner, five areas of research. These include (1) solid-state millimeter wave devices, (2) millimeter systems for imaging and communications, (3) millimeter wave high-power sources (gyrotrons), (4) GaAs gigabit logic systems, and (5) VLSI and LSI based on new materials and structures. The center supports work in these areas by providing the necessary advanced equipment and facilities and allows the University to play a major role in initiating and generating investigations into new electronic devices.
Both graduate and undergraduate students receive training and instruction in a unique facility. The second major goal of the center is to bring together the manpower and skills necessary to synthesize new areas of activity by stimulating interactions between different interdependent fields. The Electrical Engineering Department, other departments within UCLA, and local universities (such as Caltech and USC) have begun to combine and correlate certain research programs as a result of the formation of the center.
The circuits laboratories are equipped for measurements on high-speed analog and digital circuits and are used for the experimental study of communication, signal processing, and instrumentation systems. A hybrid integrated circuit facility is available for rapid mounting, testing, and revision of miniature circuits. These include both discrete components and integrated circuit chips. The laboratory is available to advanced undergraduate and graduate students through faculty sponsorship on thesis topics, research grants, or special studies.
The electromagnetics laboratories involve the disciplines of microwaves, millimeter waves, wireless electronics, and electromechanics. Students enrolled in microwave laboratory courses and/or research projects, have the opportunity to obtain experimental and design experience in the following technology areas: (1) integrated microwave circuits and antennas, (2) integrated millimeter wave circuits and antennas, (3) numerical visualization of electromagnetic waves, (4) electromagnetic scattering and radar cross-section measurements, and (5) antenna near field and diagnostics measurements.
The Microfabrication Instructional Laboratory ("Microlab") is a unique instructional facility housed in a 3300 square foot class 1000 clean room adjacent to the Nanoelectronics Research Facility ("Nanolab").
The Microlab is facilitated with a built-in lecture room, two complete UV lithography fabrication lines capable of 2 um resolution, thin-film metrology, wet/dry chemical processing, device design and simulation software tools, and four probe stations with data-acquisition capacity for rapid device characterization. Microlab teaches and supports school-wide multidisciplinary microfabrication laboratory courses in the fields of MEMS and integrated circuits. Students are given the opportunity to have hands-on experience with the step-by-step processes used to manufacture a variety of MEMS and integrated circuitry devices (e.g., layout design, simulation, integration, fabrication, and device characterization).
The integrated circuitry devices include mainly nMOSFETs, pMOSFETs, bipolar transistors, and capacitors as well as CMOS inverters, ring oscillators and digital components. The MEMS devices contain primarily accelerometers, pressure sensors, thermal/magnetic actuators, magnetometers, and stress gauges. The Microlab also offers special laboratory-based courses and research on IC-related or MEMS-related projects for undergraduate students.
Nanoelectronics Research Facility (NRF)
The state-of-the-art Nanoelectronics Research Facility for graduate research and teaching, as well as the undergraduate microelectronics teaching laboratory, are housed in an 8,500-square-foot class 100/class 1000 clean room with a full complement of utilities, including high purity deionized water, high purity nitrogen, exhaust scrubbers, and over $12M in equipment.
The NRF supports research on nanometer-scale fabrication and on the study of fundamental quantum size effects, as well as exploration of innovative nanometer-scale device concepts. The laboratory also supports many other school-wide programs in device fabrication, such as MEMS and optoelectronics.
In the Laser Laboratory students study the properties of lasers and gain an understanding of the application of this technology to optics, communication, and holography. The Photonics and Optoelectronics Laboratories include facilities for research in all of the basic areas of quantum electronics. Specific areas of experimental investigation include high-powered lasers, nonlinear optical processes, ultrafast lasers, parametric frequency conversion, electrooptics, infrared detection, and semiconductor lasers and detectors. Operating lasers include mode-locked and Qswitched Nd:YAG and Nd:YLF lasers, Ti:Al2O3 lasers, ultraviolet and visible wavelength argon lasers, wavelengthtunable dye lasers, as well as gallium arsenide, helium-neon, excimer, and highpowered continuous and pulsed carbon dioxide laser systems. Also available are equipment and facilities for research on semiconductor lasers, fiber optics, nonlinear optics, and ultrashort laser pulses. Facilities for mirror polishing and coating and high-vacuum gas handling systems are also available. These laboratories are open to undergraduate and graduate students who have faculty sponsorship for their thesis projects or special studies.
Two laboratories are dedicated to the study of the effects of intense laser radiation on matter in the plasma state. One, located in Engineering IV Building, houses a state-of-the-art table top terrawatt (T3) 400fs laser system that can be operated in either a single or dual frequency mode for laser-plasma interaction studies. Diagnostic equipment includes a ruby laser scattering system, a streak camera, and optical spectrographs and multichannel analyzer. Parametric instabilities such as stimulated Raman scattering have been studied, as well as the resonant excitation of plasma waves by optical mixing.
The second laboratory, located in Boelter Hall, houses the MARS laser, currently the largest on-campus university CO2 laser in the U.S. It can produce 200J, 170ps pulses of CO2 radiation, focusable to 1016 W/cm2. The laser is used for testing new ideas for laser-driven particle accelerators and free-electron lasers. Several high-pressure, short-pulse drivers can be used on the MARS; other equipment includes a theta-pinch plasma generator, an electron linac injector, and electron detectors and analyzers. A second group of laboratories is dedicated to basic research in plasma sources for basic experiments, plasma processing, and plasma heating.
Solid-state electronics equipment and facilities include (1) a modern integrated semiconductor device processing laboratory, (2) complete new Si and III-V compound molecular beam epitaxy systems, (3) CAD and mask-making facilities, (4) lasers for beam crystallization study, (5) thin film and characterization equipment, (6) deep-level transient spectroscopy instruments, (7) computerized capacitance-voltage and other characterization equipment, including doping density profiling systems, (8) low-temperature facilities for material and device physics studies in cryogenic temperatures, (9) optical equipment, including many different types of lasers for optical characterization of superlattice and quantum well devices, (10) characterization equipment for high-speed devices, including (11) high magnetic field facilities for magnetotransport measurement of heterostructures. The laboratory facilities are available to faculty, staff, and graduate students for their research.